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CAVITATION EROSION RESISTANCE OF ACTIVE SCREEN-LOW TEMPERATURE PLASMA NITRIDED AISI410 MARTENSITIC STAINLESS STEEL

机译:活性筛分 - 低温等离子体氮化AISI410马氏体不锈钢的空化蚀阻抗性

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AISI 410 martensitic stainless steel specimens were low temperature plasma nitrided at 400°C in a mixture of 75%N2:25%H2, during 20 h. Active screen technic was used to avoid any edge effect. The nitrided case is composed of expanded martensite (a'n) and ε-Fe3N iron nitride, whilst chromium nitride precipitation was avoided. Surface hardness reached 1275 HV0.01. The transverse microhardness profile shows a gentle hardness gradient with a NHT nitrided case depth of 28 μm. The cavitation erosion mass losses were measured as a function of exposure time. The results showed a decrease of 27 times of the mass loss compared to the non-nitride specimens. Wear rate decreased from 2.56 mg/h for the non-nitrided condition to 0.085 mg/h after nitriding. Such results showed that low temperature plasma nitriding and the formation of expanded martensite are effective to increase cavitation erosion resistance of AISI 410 stainless steel.
机译:AISI 410马氏体不锈钢试样低温等离子体在400℃下氮化为400℃,在20小时内为75%N 2:25%H2的混合物。有效屏幕技术用于避免任何边缘效果。氮化壳由膨胀马氏体(A'n)和ε-Fe3N铁氮化物组成,避免了氮化铬沉淀。表面硬度达到1275 HV0.01。横向显微硬度分布显示温和的硬度梯度,NHT氮化壳深度为28μm。作为暴露时间的函数测量空化糜烂量损失。与非氮化物标本相比,结果表明,质量损失的27倍降低。耐磨速率从2.56 mg / h降低,在氮化后的非氮化条件下降至0.085mg / h。这些结果表明,低温等离子体氮化和膨胀马氏体的形成是有效地增加AISI 410不锈钢的空化腐蚀性。

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