TOWARDS NANOELECTRONICS METROLOGY WITH LABORATORY SET-UP IN THE SOFT X-RAY RANGE

摘要

Grazing Incidence and Grazing Exit X-ray Fluorescence (GI- and GE-XRF) analyses in the soft X-ray range are excellent non-destructive method to analyze layers located at or near the surface. They are for example used for the characterization of atomic layer deposition processes (ALD) [1] or to characterize depth profiles of dopants for ultra shallow junction (USJ) applications [2,3]. At the Physikalisch-Technische Bundesanstalt (PTB), German's national metrology institute, these investigations are carried out using synchrotron radiation and calibrateted instrumentation at BESSY II. Here, we like to show the possibility to perform such kind of angle-resolved measurements with a laboratory set-up. A new laser-produced plasma-source for the soft X-ray range was developed by the Berlin Laboratory for innovative X-Ray Technologies (BLiX) at the Technical University of Berlin (TUB) and is be used for various applications [4].