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EFFECTS OF CONFINEMENT AND SURFACE RECONSTRUCTION ON THE LATTICE DYNAMICS AND THERMAL TRANSPORT PROPERTIES OF THIN FILMS

机译:监禁和表面重建对薄膜晶格动力学和热传输性能的影响

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Phonon transport in argon and silicon thin films is examined using harmonic lattice dynamics theory and the Lennard-Jones and Stillinger-Weber potentials. Film thicknesses ranging from 0.8 to 33.5 nm for argon and 0.4 to 8.6 nm for silicon are examined at a temperature of 0 K. Both reconstructed films and films built using the bulk unit cell are considered. Phonon dispersion curves for the in-plane direction and the density of states are computed from lattice dynamics and compared to predictions for a bulk system. The results from the lattice dynamics calculations are used to predict the thermal conductivities of the bulk and thin film structures.
机译:使用谐波晶格动力学理论和Lennard-Jones和Sentler-Weber潜力检查氩气中的声子输送和硅薄膜。在0K的温度下检查氩气的0.8至33.5nm的膜厚度为0.8至33.5nm,用于硅的0.4至8.6nm。使用散装单元电池构建的两种重建膜和薄膜。从晶格动力学计算面内方向的声子分散曲线和状态的密度,与散装系统的预测相比。晶格动力学计算的结果用于预测散装和薄膜结构的热导体。

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