X-Ray Laser Interference Microscopy for Advanced Studies of Laser-Induced Damages

摘要

We show results obtained using XUV interference microscopy to observe in situ nanometer-scale modifications of optical surfaces exposed to intense sub-ns laser pulses. The surface was irradiated by a blue "damaging" laser (438 nm) and diagnosed by a soft X-ray laser based on neon-like zinc, emitting at 21.2 nm. Investigated objects were thin plane beam-splitters made of fused silica (SiO2) This technique could be used to reveal effects involved in formation of laser-induced damages in optical surfaces exposed to intense laser pulses.