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Formation of Platinum films by Electrochemical Atomic Layer Deposition (ALD) via Redox Replacement of UPD: Studies of Pb UPD as a Sacrificial Metal

机译:通过电化学原子层沉积(ALD)通过氧化还原替换的铂膜的形成:PB初级的研究作为牺牲金属

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The development of Surface limited Redox Replacement (SLRR) for formation of Platinum nanofilms using Pb UPD is described in this paper. The SLRR involved formation of Pb UPD and its spontaneous replacement by Pt, at the open circuit potential (OCP), from a Pt cation solution. This reaction was repeated to form thicker Pt nanofilms. An electrochemical flow cell system was employed for growing the Pt nanofilms. Changes in the OCP were monitored during the exchange process, and showed that exchange of Pt for Pb was complete in less than 3 minutes. The increase in Pb deposition charge from cycle to cycle, as well as AFM images, showed the deposition was not just layer by layer, 2D, but resulted in significant roughening. An attempt at electrochemical annealing by using adsorbed I atoms was also tried, but with no positive result. Films were analyzed by EPMA, and showed nearly uniform composition across the deposit, with no significant amount of Pb present.
机译:本文描述了使用PB UPD形成铂纳米膜的表面有限氧化还原替代(SLRR)的开发。 SLRR涉及从PT阳离处解决方案的开路电位(OCP)在开路电位(OCP)处形成PB UPD及其自发替代。重复该反应以形成较厚的Pt nanofilms。采用电化学流动细胞系统来生长Pt纳米丝。在交换过程中监测OCP的变化,并显示PT的交换在不到3分钟内完成PT。从循环到循环的Pb沉积电荷的增加以及AFM图像显示沉积不仅是通过层,2D层的层,但导致显着粗糙化。还尝试了使用吸附的I原子进行电化学退火的尝试,但没有阳性结果。通过EPMA分析薄膜,并在沉积物上显示几乎均匀的组合物,没有显着量的Pb存在。

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