首页> 外文会议>International Kharkov Symposium Physics and Engineering of Millimeter and Sub-Millimeter Waves >INFLUENCE OF THE ACCELERATING POTENTIAL PULSE FORM ON THE PROPERTIES OF THE HELICAL ELECTRON BEAM IN GYRO-DEVICES
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INFLUENCE OF THE ACCELERATING POTENTIAL PULSE FORM ON THE PROPERTIES OF THE HELICAL ELECTRON BEAM IN GYRO-DEVICES

机译:加速潜在脉冲形式对陀螺仪 - 装置螺旋电子束性能的影响

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The efficiency of powerful gyro-devices strongly depends on the quality of Helical Electron Beams (HEBs) used as an active media for RF generation. The most popular system to form HEB is the magnetron-injection gun (MIG). In MIGs one of the most important factors influencing on the quality of HEBs is the reflection of particles from the magnetic mirror near the cavity [1]. Such particles are accumulated in the adiabatic trap between cathode and cavity, make worse beam quality and can initiate the beam instability in regimes with big pitch-factor. Usually numerical simulation of particle's accumulation process is performed within the simplest assumption that the pulse has the form of the "step" and the current density and accelerating voltage are established instantly [2]. But real pulse front duration in gyro-devices is much longer than the period of oscillations of particles in the trap (at least in one or two orders). So, in principle, one can expect that the "history" of real growing of the accelerating voltage U(t) may influence on the beam behavior and final beam properties as well. Besides that, momentary switching on the voltage leads to such well-known effect, as the accelerating of the "head" of the beam. Accelerated particles also may change the conditions to catch electrons into adiabatic trap in comparison with situation of smooth increasing of potential. Below the investigation of the influence of the pulse form U(t) on the establishing process in HEB a performed. The case when HEB has big pitch-factor and so trapped electrons influence on the beam parameters essentially is considered.
机译:强大的陀螺仪装置的效率强烈地取决于螺旋电子束(HEBS)的质量用作RF代的活性介质。形成HEB的最受欢迎的系统是磁控管注射枪(MIG)。在MIGS中,影响HEBS质量的最重要因素之一是粒子从腔附近的磁镜的反射[1]。这种颗粒在阴极和腔之间的绝热阱中累积,使光束质量更差,可以在具有大俯仰因子的制度中引发光束不稳定性。通常在最简单的假设内执行粒子累积过程的数值模拟,即脉冲具有“步骤”的形式,并且即时建立电流密度和加速电压[2]。但是陀螺仪 - 装置中的真实脉冲前持续时间远比陷阱中颗粒的振动周期长得多(至少在一个或两个订单中)。因此,原则上,人们希望能够对加速电压U(T)的实际生长的“历史”也可能影响光束行为和最终光束性能。除此之外,瞬间接通电压导致这种众所周知的效果,作为梁的“头部”的加速。加速颗粒也可以改变与光滑潜力的情况相比将电子捕捉到绝热陷阱的条件。低于调查脉冲形式U(t)对在HEB A的建立过程中的影响。当希布具有大的俯仰系数并且因此基本上考虑了对光束参数的捕获电子的影响。

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