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Characterization of Lithographically Structured PZT Thick Film Structures

机译:光刻结构的PZT厚膜结构的表征

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摘要

A novel thick film process using lithography was presented earlier. This process overcomes the restrictions of conventional thick-films in terms of alignment, feature sizes and reproducibility. To successfully design micro electro-mechanical systems (MEMS) using this process the mechanical, electrical and piezoelectric properties are characterized and compared to conventionally produced ceramic plates The standard measurements for piezoelectric constants are not applicable for thick films, as the film properties can never be measured independently from the substrate. A model involving analytical theory and simulation is developed and the constants are derived thereby.
机译:使用光刻的新型厚膜工艺提前介绍。该过程克服了在对准,特征尺寸和再现性方面的传统厚膜的限制。为了成功设计使用该过程的微电机械系统(MEMS),其特征在于和与常规产生的陶瓷板相比,对压电常数的标准测量不适用于厚膜,因为薄膜性能永远不会是独立于基板测量。开发了涉及分析理论和模拟的模型,由此导出常数。

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