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RET for the Wiring Layer of A 3-D Memory

机译:保留3-D内存的布线层

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摘要

A typical wiring layer of SanDisk 3-dimensional memory device includes a dense array of lines. Every other line terminates in an enlarged contact pad at the edge of the array. The pitch of the pads is twice the pitch of the dense array. When process conditions are optimized for the dense array, the gap between the pads becomes a weak point. The gap has a smaller depth of focus. As defocus increases, the space between the pads diminishes and bridges. We present a method of significantly increasing the depth of focus of the pads at the end of the dense array. By placing sub-resolution cutouts in the pads, we equalize the dominant pitch of the pads and the dense array.
机译:Sandisk 3维存储器件的典型布线层包括密集的线阵列。每隔一条线终止于阵列边缘的放大接触垫中。垫的间距是致密阵列的间距的两倍。当处理条件针对致密阵列进行优化时,焊盘之间的间隙变为弱点。差距具有较小的焦深。随着散焦增加,垫之间的空间会减少和桥梁。我们提出了一种显着增加焊盘末端的焦点深度在密集阵列的末端。通过将子分辨率切口放在垫中,我们均衡焊盘和密集阵列的主导间距。

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