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Characterisation of thin film piezoelectric materials by differential interferometric techniques

机译:差动干涉技术表征薄膜压电材料

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Piezoelectric thin films are considered emergent materials for integration within Micro Systems Technology (MST) or MEMS devices. The development of suitable measurement facilities to characterise the materials functional properties is complicated by the fact that the film is often attached to a substrate which acts to clamp the film thus affecting the system performance. This paper describes a new differential interferometer system based on common path Jamin optics and measurement lock-in techniques that is able to analyse the displacements of the thin film to 1/10's of pm resolution. The film/substrate acts as a natural bending element and this effect means that the displacement measurements must be carefully controlled to minimise any substrate bending. The system designed at NPL is able to measure the degree of substrate bend so that an 'effective' piezoelectric coefficient may be calculated. Results will be shown for ceramic monolithic materials, quartz single crystal material and sol-gel derived thin and thick films of PZT on Si substrates.
机译:压电薄膜被认为是用于在微系统技术(MST)或MEMS器件内集成的突出材料。合适的测量设施的开发表征材料功能性质的特性是复杂的事实,即薄膜通常连接到用于夹紧薄膜的基板,从而影响系统性能。本文介绍了一种基于公共路径的jamin光学和测量锁定技术的新的差动干涉仪系统,其能够将薄膜的位移分析到PM分辨率的1/10。薄膜/基板用作天然弯曲元件,并且该效果意味着必须小心地控制位移测量以最小化任何基板弯曲。在NPL设计的系统能够测量基板弯曲程度,使得可以计算“有效”压电系数。结果将显示陶瓷整体材料,石英单晶材料和溶胶 - 凝胶在Si衬底上衍生的PZT薄和厚膜。

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