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FDSOI vs FinFET: differentiating device features for ultra low power IoT applications

机译:FDSOI VS FINFET:用于超低功耗和IOT应用程序的差异化设备功能

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This paper reviews the main differentiating features of planar FDSOI devices vs planar bulk and 3D FinFETs for ultra-low power and IoT (Internet of Things) applications. The interest of using back-bias, the specific FDSOI device/design feature, to maximize the performance/power efficiency, to mitigate the process variability and to suppress the leakage is highlighted in this paper. Low parasitic gate capacitance, low V mismatch associated with its undoped channel, and low gate resistance linked to the gate-first integration also bring some competitive advantages to FDSOI over FinFETs for Analog and RF devices.
机译:本文综述了平面FDSOI设备的主要差异化特性与超低功耗和IOT(物联网)应用的平面散装和3D FinFET。使用反向偏置的兴趣,特定的FDSOI设备/设计特征,以最大限度地提高性能/功率效率,以减轻工艺变化和抑制泄漏的效果。低寄生栅极电容,低V不匹配与其未掺杂的通道相关联,与栅极第一集成的低栅极电阻也为模拟和RF器件的FINFET带来了一些竞争优势。

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