Nanosphere lithography (NSL) [1] is a well-known, low-cost and quick preparation method, which can be used for self-assembly of magnetic nanostructures or nonstructural arrays. NSL is a powerful fabrication technique to inexpensively produce nonstructural arrays with controlled shape, size, and interparticle spacing. By now, various shapes of nanostructures, such as triangularly-shaped nanostructures (TSN), hexagonal nanostructures, nanorings, nanogaps, nanooverlaps, and nanostructure chains, are obtained by different ways through NSL, however the magnetization process is rarely studied [2]. In this paper, we adopt micromagnetic simulation based minimizing the energy to study the ground state of TSN formed by NSL, and to understand the reversal magnetization mechanism of this nanostructures.
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