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Thermal Stability in Textured CoFe/IrMn Films with Os Buffer and Barrier Layer

机译:纹理COFE / IRMN薄膜的热稳定性与OS缓冲和阻挡层

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Recently, the developments of the spintronics devices have been well expanded. The behaviors of the basic unit part in the magnetic devices are dependence on many factors, among which crystal structure and thermal stability of magnetic films play an important role. Suitable buffer layer is needed for antiferromagnetic (AFM) layer to induce the FM/AFM coupling in magnetic tunnel junction (MTJ) or spin valve (SV) structures. In this article, we extend our previous works [1] to investigate the characterization of the Osmium (Os) in a textured magnetic multi-layer structure system. The properties and characterization of buffer layer and diffusion barrier using Os are reported.
机译:最近,SpintRonics设备的开发已经很好地扩展。磁性装置中基本单元部分的行为是对许多因素的依赖性,其中磁性膜的晶体结构和热稳定性起着重要作用。反铁磁(AFM)层需要合适的缓冲层,以诱导磁隧道结(MTJ)或旋转阀(SV)结构中的FM / AFM联接器。在本文中,我们将先前的作品[1]扩展到纹理磁性多层结构系统中的锇(OS)的表征。报道了使用OS的缓冲层和扩散屏障的性质和表征。

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