Soft UV nanoimprint lithography has be used to fabricate third order Bragg gratings for visible light and microfluidic dye laser operation. Soft stamps has been made by casting a poly-dimethylsiloxane on a silicon mould and a bi-layer imprinting process has used to obtain resist patterns of high density and high aspect ration line-and-space features. After a lift-off of thin nickel film, reactive ion etching was applied to transfer the patterned features into a glass substrate with aspect ratios up to 12. The integration of the fabricated Bragg gratings into a microfluidic chip allowed us to observe laser emission from a dye molecule (Rhodamine 6G) solution of very small volumes (30 to 75 pL), thereby providing a new method of making functioning optofluidic devices.
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