Damage free HRTEM observation of cBN films deposited on ultra-thin Si substrates

摘要

High-resolution transmission electron microscopy (HRTEM) has been used for the evaluation of nanostructures of cubic boron nitride (cBN) films prepared by vapor deposition. However, conventional TEM specimen preparation includes mechanical and ion polishing processes, which were found to introduce damages into cBN films. And, the observed film structure will be changed from the original one.