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Effects of the preparation conditions on the orientation and dielectric properties of PZT films prepared by PVP-assisted sol-gel method

机译:制备条件对PVP辅助溶胶 - 凝胶法制备PZT薄膜取向和介电性能的影响

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PZT gel films were deposited on Pt(111)/TiO_2/SiO_2/Si(100) substrates by spin-coating using a solution of molar composition, Pb(NO_3)_2 : Zr(OC_3H_7~n)_4 : Ti(OC_3H_7~i)_4 : PVP : CH_3COCH_2COCH_3 : CH_3OC_2H_4OH : n-C_3H_7OH = 1.1 : 0.53 : 0.47 : 0.5 : 0.5 : 22 : 0.98. The gel films were heated at 300 deg C or 600 deg C for 10 min and then at 650 deg C for 10 min. In addition, in order to investigate the effects of a PbO seeding layer on crystallographic orientation, PbO gel films were deposited by spin-coating using a solution of molar composition, Pb(NO_3)_2 : CH_3OC_2H_4OH : PVP = 1.0 : 22 : 0.5, and heated at 500 deg C for 10 min. When pre-heating was conducted at 300 deg C, the film had no orientation, while pre-heating at 600 deg C resulted in higher PZT(100) intensity than (101). PZT(100) was also increased by introducing a seeding layer. These experimental results suggest that there is a possibility that the films with preferred orientation are obtained by controlling the heat-treatment conditions and by introducing the PbO seeding layer.
机译:使用摩尔组合物的溶液,Pb(NO_3)_2:Zr(OC_3H_7〜I)沉积Pt(111)/ TiO_2 / SiO_2 / Si(100)衬底上沉积在Pt(111)/ TiO_2 / SiO_2 / Si(100)底物上沉积在Pt(111)/ TiO_2 / SiO_2 / Si(100)衬底上沉积基底。:Ti(OC_3H_7〜I )_4:PVP:CH_3COCH_2COCH_3:CH_3OC_2H_4OH:N-C_3H_7OH = 1.1:0.53:0.47:0.5:0.5:22:0.98。将凝胶膜在300℃或600℃加热10分钟,然后在650℃下加热10分钟。另外,为了研究PBO播种层对晶体取向对晶体取向的影响,使用摩尔组合物的溶液,Pb(NO_3)_2:CH_3OC_2H_4OH:PVP = 1.0:22:0.5,并在500℃下加热10分钟。当在300℃进行预加热时,薄膜没有取向,同时在600℃下预热导致比(101)更高的PZT(100)强度。通过引入播种层也增加了PZT(100)。这些实验结果表明,通过控制热处理条件并通过引入PBO播种层,可以获得具有优选取向的膜的可能性。

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