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Study of pH Sensing Characteristics Based on TiO_2/ITO Glass with Annealing Treatment

机译:基于TiO_2 / ITO玻璃的pH传感特性研究退火处理

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In this study, the titanium oxide (TiO_2) thin films were deposited on ITO glass by sol-gel method. And the sensing structures were annealed at 200, 300, 400 and 500 °C for 30 min, respectively. The annealed films were further characterized by AFM. The average roughness of the annealed films were kept within 12.5-17 nm as the temperature increased form 200 °C to 500 °C. In addition, the TiCh/ITO glass structure was connected with a commercial MOSFET device, and the extended-gate field-effect transistor (EGFET) was formed and applied to as a pH sensor. The current-voltage (IDS-VDS) curves were measured with the I-V measurement system under different buffer solutions (pH=l~ll) as well as the pH response of the EGFET device was operated at constant voltage constant current (CVCC) circuit in this study. The experimental results shown that the pH sensitivity of the EGFET device were 85.57 fi A/pH and 61.26 mV/pH at annealed temperature of 200 °C. And the sensitivity changed to 66.95 jlA/pli and 53.86 mV/pH as the annealed temperature was arise to 500 °C.
机译:在该研究中,通过溶胶 - 凝胶法在ITO玻璃上沉积氧化钛(TiO_2)薄膜。并且传感结构分别在200,300,400和500℃下退火30分钟。通过AFM进一步表征退火的薄膜。退火薄膜的平均粗糙度保持在12.5-17nm之内,因为温度升高至200℃至500℃。另外,TICH / ITO玻璃结构与商业MOSFET器件连接,并将延伸栅极场效应晶体管(EGFET)形成并施加为pH传感器。在不同的缓冲溶液(pH = L〜LL)下用IV测量系统测量电流电压(IDS-VDS)曲线,以及EGFET器件的pH响应在恒压恒流(CVCC)电路下操作这项研究。实验结果表明,EGFET装置的pH敏感性为85.57×pH和61.26mV / pH,在200℃的退火温度下。并且随着退火温度的增生,敏感性变为66.95JLA / PLI和53.86mV / pH值,以500℃。

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