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Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, 5625 Renmin Street, Changchun 130022, China

机译:中国科学院长春应用化学研究所,5625年人民街,长春130022

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We have comparatively studied the addition of chromium and vanadium in titania. Cr and V content were changed by means of insets placed in the titanium target. Structural, compositional and electrical analyses of different series of thin films, made by XRf, XRD, are presented. Electrical characterization not only showed that Cr doped layers were very sensitive to ethanol within a useful range for applications, but also allowed to verify that the electrical behaviour is dependent on the structure of film. Finally, the Cr and V concentrations that gives the best results in terms of sensing performances has been determined and a correlation between structural and electrical measurement has been evidenced.
机译:我们在二氧化钛中进行了铬和钒的添加。通过放置在钛目标中的插孔来改变CR和V含量。提出了由XRF,XRD制成的不同系列薄膜的结构,组成和电气分析。电学表征不仅表明CR掺杂层对应用的有用范围内的乙醇非常敏感,而且还允许验证电动特性是否取决于薄膜的结构。最后,已经确定了在感测性能方面提供最佳结果的Cr和V浓度,并且已经证明了结构和电测量之间的相关性。

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