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Silicon Planar Technology for Single-Photon Optical Detectors

机译:单光子光学探测器的硅平面技术

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In this paper we report the results relative to the design and fabrication of Single Photon Avalanche Detectors (SPAD) operating at low voltage in planar technology. These silicon sensors consist of pn junctions that are able to remain quiescent above the breakdown voltage until a photon is absorbed in the depletion volume. This event is detected through an avalanche current pulse. Device design and critical issues in the technology are discussed. Experimental test procedures are then described for dark-counting rate, afterpulsing probability, photon timing resolution, quantum detection efficiency. Through these experimental setups we have measured the electrical and optical performances of different SPAD technology generations. The results from these measurements indicate that in order to obtain low-noise detectors it is necessary to introduce a local gettering process and to realize the diode cathode through in situ doped polysilicon deposition. With such technology low noise detectors with dark counting rates at room temperature down to 10c/s for devices with 10μm diameter, down to 1kc/s for 50 μm diameter have been obtained. Noticeable results have been obtained also as far as time jitter and quantum detection efficiency are concerned. This technology is suitable for monolithic integration of SPAD detectors and associated circuits. Small arrays have already been designed and fabricated. Preliminary results indicate that good dark count rate uniformity over the different array pixels has already been obtained.
机译:在本文中,我们报告了相对于在平面技术的低压下操作的单光子雪崩探测器(SPAD)的设计和制造的结果。这些硅传感器由PN结组成,该PN结可以在击穿电压上方保持静态,直到光子被吸收在耗尽量中。通过雪崩电流脉冲检测此事件。讨论了技术设计和关键问题。然后针对暗计数速率,后续脉冲概率,光子正时分辨率,量子检测效率来描述实验测试程序。通过这些实验设置,我们已经测量了不同SPAD技术代的电气和光学性能。来自这些测量的结果表明,为了获得低噪声检测器,必须引入局部吸收过程,并通过原位掺杂的多晶硅沉积实现二极管阴极。利用这种技术的低噪声探测器,在室温下的暗计数速率下降至10℃/秒,直径为10μm,下降至1kc / s,直径为50μm。目前也可以获得明显的结果,而不是抖动和量子检测效率。该技术适用于单片探测器和相关电路的单片集成。小阵列已经设计和制造。初步结果表明已经获得了不同阵列像素上的良好的暗计数率均匀性。

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