PHASE ANISOTROPY MEASUREMENTS IN MULTILAYER DIELECTRIC LASER MIRRORS DURING THEIR MANUFACTURE PROCESS AND CORRECTIONS INTRODUCED IN THE PRODUCED LASERS

摘要

In this paper on the basis of the development and manufacture experience of two-mode lasers, i.e. two-frequency laser with linear orthogonal polarizations of generated waves (used in heterodyne interferometry) and four-frequency ring lasers with linear orthogonal mode polarizations (used in differential laser gyros) described and analyzed are: a new measurement and control method of multilayer dielectric mirrors phase anisotropy during the deposition (by analyzing the mirror surface-reflected two-frequency radiation with linear orthogonal components), block diagram of control measurement device based on the two-frequency laser used in the vacuum-evaporation plant as well as a measurement signal shaping algorithm and the proposed measurement method accuracy characteristics. The correction methods of multilayer dielectric mirrors phase anisotropy (and laser orthogonally polarized waves difference beat frequency) used in the manufacture process of two-mode lasers (linear and ring) are reviewed. At the stage of vacuum technological processing of the laser, soldered to a vacuum-exhaust station (or after its cutting off from the station) a predetermined generated wave beat frequency by using a special SHF mirror processing is achieved as well as mirror phase anisotropy stabilization and drift decrease of the relevant beat frequency of the orthogonally polarized waves during laser operation is provided.