X-ray and EUV spectral instruments for plasma source characterization

摘要

A set of spectral analytic instruments has been developed for absolute intensity measurements in a spectral range of 1 - 600 Å: (1) several modifications of grazing incidence spectrographs; (2) EUV monochromator- spectrometer with a constant angle of deviation; (3) focusing crystal von Hamos spectrometer using cylindrical mica and pyrolytic graphite crystals and a CCD linear array as a detector. These instruments are useful for plasma diagnostics, x-ray and EUV spectroscopy of laser-generated plasmas and capillary discharge plasmas, x-ray and EUV reflectometry, radiometry and x-ray fluorescence application.