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Direct Measurement of the Nanoscale Mechanical Properties of NiTi Shape Memory Alloy

机译:直接测量NITI形状记忆合金的纳米级力学性能

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The mechanical properties of sputter-deposited NiTi shape memory alloy thin films ranging in thickness from 35 nm to 10 urn were examined using nanoindentation and atomic force microscopy (AFM). Indents made in films as thin as 150 nm showed partial shape recovery upon heating, although film thickness was found to have a marked effect on the results. A modified spherical cavity model is used to describe the findings, which suggest that the substrate tends block the shape memory effect as film thickness decreases below a threshold level which is specific to applied load. This has the net effect of decreasing the indent recovery below the critical film thickness. The fact that the spherical cavity model predicts the critical film thickness at which the shape memory effect is blocked indicates that the increased recovery of nanoscale indentations is due to a suppression of plastic processes rather than an enhancement of shape memory processes.
机译:使用纳米茚命和原子力显微镜(AFM)检查溅射沉积的烟雾沉积的NITI形状记忆合金薄膜厚度范围为35nm至10瓮的薄膜。薄膜制备的胶片作为150nm的缩进在加热时显示出部分形状恢复,尽管发现膜厚度对结果具有明显的影响。改进的球形腔模型用于描述该发现,表明基板倾向于使形状记忆效应块变为膜厚度低于施加负载的阈值水平。这具有降低临界膜厚度以下的缩进恢复的净效果。球形腔模型预测形状记忆效应被阻断的临界膜厚度的事实表明,纳米级压痕的增加是由于抑制塑料过程而不是形状存储器工艺的增强。

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