首页> 外文会议>Symposium on mechanical properties of nanostructured materials and nanocomposites >Deformation Processes during Indentation of Mesoporous Silica Thin Films
【24h】

Deformation Processes during Indentation of Mesoporous Silica Thin Films

机译:中孔二氧化硅薄膜压痕期间的变形过程

获取原文

摘要

Nanoindentation was used to probe the mechanical response of mesoporous silica films as a function of processing treatment. A contrasted behaviour appears between low temperature processed films which retain the templating agent and are thus little compressible, and high temperature processed films, which are more condensed and also exhibit high porosity. We suggest that the behaviour of the former is dominated by shear flow, at least above a given threshold, while the latter are characterized by a yield strength in compression as is commonly found in porous materials. The response to indentation allows fast qualitative comparison of mechanical responses: in the present work, we show that a fast UV-Oj treatment results in mechanical properties which are undistinguishable from a much more cumbersome high temperature heat treatment.
机译:纳米indentation用于探测中孔二氧化硅膜的机械响应作为加工处理的函数。在低温加工膜之间出现对比的行为,其保留模板剂,因此很少可压缩,并且高温加工薄膜,其更加浓缩并表现出高孔隙率。我们建议前者的行为由剪切流导地位,至少在给定阈值之上,而后者的特征在于屈服强度,通常在多孔材料中发现。对压痕的反应允许快速定性比较机械响应:在本作中,我们表明快速的UV-OJ处理导致机械性能,这些性能不区分,从更繁琐的高温热处理中不可以区分。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号