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Process Errors and Aspects for Higher Resolution in Conventional Stereolithography

机译:在传统立体光刻中的更高分辨率的过程错误和方面

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摘要

Due to the rapid development of precision manufacturing technologies, there is a growing market need for appropriate rapid prototyping methods with higher resolution. This paper presents aspects for a general optimization of Stereolithography accuracy and gives a deeper analysis of important process errors. Beside a higher precision due to improved optical components, it can be shown that for a better vertical resolution one must mainly reduce the penetration depth of the photopolymer. We found that this is also possible with conventional Stereolithography materials by using a different wavelength, achieving cured rugged layers with a thickness of 20 micrometer. The major accuracy aspect lies in the understanding of the layer deposition process. A CFD (computational fluid dynamics) study helps to describe important phenomena of blade based coating techniques. As a result, the inaccuracy of the layer deposition is the general limiting factor in Stereolithography. This knowledge can be directly applied to commercial Stereolithography systems helping users to achieve higher process accuracy.
机译:由于精密制造技术的快速发展,由于具有更高分辨率的适当快速原型设计方法,市场需求日益增长。本文提出了一般优化立体光刻精度的方面,并对重要的过程错误进行了更深入的分析。除了改进的光学元件引起的较高精度之外,可以示出,对于更好的垂直分辨率,必须主要减小光聚合物的穿透深度。我们发现,通过使用不同的波长,通过使用不同的波长,实现厚度为20微米的固化崎岖的层,这也可以采用传统的立体光刻材料。主要的精度方面在于了解层沉积过程。 CFD(计算流体动力学)研究有助于描述基于叶片的涂料技术的重要现象。结果,层沉积的不准确是立体刻录中的一般限制因子。这些知识可以直接应用于商业立体镀系统,帮助用户实现更高的过程精度。

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