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Microstructure Characteristics and Oxidation Behavior of Molybdenum Disilicide Coatings Prepared by Low Pressure Plasma Spraying

机译:低压等离子体喷涂制备的钼二硅化物涂层的微观结构特征及氧化行为

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Molybdenum disilicide (MoSi_2) has been applied as protective coating material on various substrates fabricated by different methods due to its good oxidation resistance at elevated temperature, relatively low density and coefficient of thermal expansion and high thermal conductivity. In this work, MoSi_2 coatings were fabricated by low pressure plasma spraying technology (LPPS). Their morphology, composition and microstructure characteristics were intensively investigated by SEM, XRD, EDS and TEM. The oxidation behaviors of MoSi_2 coatings were also explored. The results showed that the MoSi_2 coating was compact with porosity less than 5%. Its microstructure exhibited typical lamellar character. The MoSi_2 coating was made up of grains with irregular shapes and different sizes of 0.1-0.2 μm. It was mainly composed of tetragonal and hexagonal MoSi_2 phases. A small amount of tetragonal Mo_5Si_3 phase formed and randomly distributed in the matrix of MoSi_2. The MoSi_2 coating exhibited excellent oxidation-resistant behavior at 1773K, which resulted from the continuous dense glassy SiO_2 film formed on its surface.
机译:钼二硅化物(MOSI_2)已经在不同方法制造的各种基板上应用于保护涂料,这是由于其在升高的温度下的良好抗氧化性,相对低的密度和热膨胀系数和高导热率和高导热率。在这项工作中,MOSI_2涂层由低压等离子体喷涂技术(LPP)制造。它们通过SEM,XRD,EDS和TEM集中研究了它们的形态,组成和微观结构特征。还探讨了MOSI_2涂层的氧化行为。结果表明,孔隙率小于5%,MOSI_2涂层紧凑。其微观结构表现出典型的层状字符。 MOSI_2涂层由具有不规则形状和0.1-0.2μm的不同尺寸的晶粒组成。它主要由四方和六边形MOSI_2阶段组成。在MOSI_2的基质中形成并随机地分布在MOSI_2基质中的少量四方MO_5SI_3相。 MOSI_2涂层在1773K处表现出优异的抗氧化性能,从其表面上形成的连续致密玻璃SiO_2膜引起。

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