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Development of Low Power Plasma Spray Process Using Atmospheric Pressure Microwave Plasma

机译:大气压微波等离子体的低功率等离子喷涂工艺的研制

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Low power plasma spray process is attracted attention for deposition of coating with reducing microstructure change of coating and substrate. Atmospheric pressure microwave plasma spraying is a new method for fabricating coating under low power below 1kW. The generated plasma temperature exceeded above 4000 K, and was available for plasma spraying of Al, Cu, hy-droxyapatite (HAp), and Cu onto steel substrate below 1kW. Moreover, Cr coating was successfully fabricated by decreasing the nozzle diameter for increase of the particle velocity up to 135.4 m/s. As a result, low power input realized the Cr coating on heat susceptible substrates, such as CFRP and high carbon steel. Also, TiO_2 coating was successfully fabricated with high photocatalytic activity by reducing the heat input to spray particles.
机译:低功率等离子体喷雾过程被引起了沉积涂层的沉积涂层和涂层的微观结构变化。大气压微波等离子体喷涂是一种在低功率下涂层的新方法,低于1kW。产生的等离子体温度超过4000k,可用于Al,Cu,Hy-甲氧基哌啶(Hap)和Cu的等离子体喷涂到1kW以下的钢基板上。此外,通过降低喷嘴直径来成功制造Cr涂层,以增加粒子速度高达135.4 m / s。结果,低功率输入实现了热易感基材的Cr涂层,例如CFRP和高碳钢。此外,通过将热催化活性降低到喷雾颗粒,通过高光催化活性成功制造TiO_2涂层。

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