Creation of Subsuface Lattice Defects in AgBr(I) Tabular Microcrystals by Splash Iodide Addition Technique

机译：飞溅碘化加法技术在Agbr（i）表格微晶中的亚面晶格缺陷的创建

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The influence of the methods of the addition of iodide solution with different concentrations, halide composition of substrate tabular crystals and dispersion characteristics of resulting heterophase AgBr(I) tabular crystals with subsurface lattice defects on photographic characteristics of these crystals have been investigated.

机译：已经研究了用不同浓度的碘化物溶液加入碘化物溶液的影响，并研究了这些晶体的照相特性的所得杂晶晶晶体的壳体片状晶体的卤素组合物的卤化物片状晶体和具有地下晶格缺陷的色谱晶体的分散特性。

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《International Symposium on Silver Halide Technology》|2004年||共4页
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L. V. Sotnikova; B. A. Sechkarev; M. A. Bezjazychnaja; J. N. Afonkina;
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中图分类 TQ572.1-53;
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4. Creation of Subsuface Lattice Defects in AgBr(I) Tabular Microcrystals by Splash Iodide Addition Technique [C] . L. V. Sotnikova, B. A. Sechkarev, M. A. Bezjazychnaja, International Symposium on Silver Halide Technology . 2004

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Creation of Subsuface Lattice Defects in AgBr(I) Tabular Microcrystals by Splash Iodide Addition Technique

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