Contact Angle Measurements on Polysilicon for Surface Micromachining Applications

摘要

Polysilicon layers deposited by Low Pressure Chemical Vapour Deposition (LPCVD) on sacrificial oxides are used for surface micromachined structures. Stiction is a major problem in surface micromachining both during processing and in use. Contact angle measurements on surfaces can give indication on the adhesivity of the surface. In this paper, contact angle measurements on polysilicon surface after different treatments are reported with a view to understand their stiction behaviour. We also report on surface roughness measurements on these samples.