Preferred crystallographic orientation or texture is a typically observedphenomenon in polycrystalline thin films. In addition, texture was revealed in nu-merous x-ray diffraction studies to increase with layer thickness. The phenomenonis rather significant for the optimized preparation of thin films, but was difficult tomeasure so far. A method is presented that allows for texture profiling by exploitingthe anomalous variation of the x-ray attenuation coefficient in the vicinity of anelemental absorption edge. The study reports the application of the technique tothin ZnO:Al films by measuring with wavelengths below and above the Zn K edge.Large texture gradients between 0.03 and 0.3 mrd/nm were revealed to arise in thesesamples. Anomalous diffraction is concluded to enable the determination of texturegradients as required in many thin film projects.
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