首页> 外文会议>Symposium E, "Materials for high-temperature superconductor technologies" >High-J{sub}c YBCO coatings on reel-to-reel dip-coated Gd{sub}2O{sub}3 seed buffer layers epitaxially fabricated on biaxially textured Ni and Ni-(3atW-1.7atFe)alloy tapes
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High-J{sub}c YBCO coatings on reel-to-reel dip-coated Gd{sub}2O{sub}3 seed buffer layers epitaxially fabricated on biaxially textured Ni and Ni-(3atW-1.7atFe)alloy tapes

机译:在卷轴到卷轴浸涂的Gd {sub} 2O {sub} 2o {sub} 3上外延织物的三种种子缓冲层。在双轴纹理Ni和Ni-(3at%w-1.7at%Fe)合金上外延制造的种子缓冲层磁带

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A low-cost, non-vacuum reel-to reel dip-coating system has been used to continuously fabricate epitaxial Gd{sub}2O{sub}3 buffer layers on mechanically strengthened, biaxially textured Ni(3at.%W- 1.7at%Fe), defined as Ni-alloy, metal tapes. X-ray diffraction analysis of the seed Gd{sub}2O{sub}3 layers indicated that well textured films can be obtained at processing temperatures (T{sub}p) between 1100 and 1175°C. Processing speed did not significantly affect the crystalline quality of the Gd{sub}2O{sub}3. Scanning electron microscopy revealed a continuous, dense and crack-free surface morphology for these dip-coated buffers. The Gd{sub}2O{sub}3 layer thickness led to remarkable differences in the growth characteristics of the subsequent YSZ and CeO{sub}2 layers deposited by rf-magnetron sputtering. Epitaxial YBCO films grown by pulsed laser deposition on the short prototype CeO{sub}2/YSZ/Gd{sub}2O{sub}3/Ni-(3at%W- 1.7at%Fe) conductors yielded self-field critical current densities (J{sub}c) as high as 1.2×10{sup}6 A/cm{sup}2 at 77 K. Pure Ni tapes were used to asses the viability of dip-coated buffers for long length coated conductor fabrication. The YBCO films, grown on 80 cm long and 1 cm wide CeO{sub}2/YSZ/Gd{sub}2O{sub}3 buffered Ni tapes by the industrially scalable ex-situ BaF{sub}2 precursor process, exhibited end-to-end self-field J{sub}c of 6.25×10{sup}5 A/cm{sup}2 at 77 K.
机译:低成本,非真空卷轴到卷轴浸涂系统已被用于连续制造在机械加强的双轴纹理Ni(3at。%W- 1.7AT%上的外延Gd {Sub} 2O {Sub} 3缓冲层Fe),定义为Ni-合金,金属胶带。种子GD {Sub} 2O {Sub} 3层的X射线衍射分析表明,在1100至1175°C之间的处理温度(t {sub} p)处可以获得良好的纹理薄膜。处理速度没有显着影响GD {Sub} 2O {Sub} 3的晶体质量。扫描电子显微镜显示出这些浸涂缓冲液的连续,致密和无裂缝的表面形态。 GD {Sub} 2O {Sub} 3层厚度导致了由RF-磁控溅射沉积的随后的YSZ和CEO {Sub} 2层的生长特性的显着差异。通过脉冲激光沉积在短型原型CEO {Sub} 2 / YSZ / Gd {Sub} 2O} 3 / Ni-(3AT%W-1.7AT%Fe)导体上产生自场临界电流密度的脉冲激光沉积(J {sub} c)高达1.2×10 {sup} 6a / cm {sup} 2,77k。纯ni胶带用于赋予浸涂层缓冲器的活力,用于长长度涂覆的导体制造。 YBCO薄膜,长度长80厘米长1厘米宽的CEO {SUB} 2 / YSZ / GD {SUB} 2O {SUB} 3缓冲的NI磁带被工业上可扩展的前地BAF {SUB} 2前体进程,表现出结束-To-End自场J {Sub} C为6.25×10 {sup} 2,在77k时为5a / cm {sup} 2。

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