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Au-Al Solid Phase Diffusion Flip Chip Bonding -Desirable Composition of Au-Al Intermetallic Compound for Stable Bonding-

机译:Au-Al固相扩散倒装芯片粘接 - 用于稳定粘接的Au-Al金属间化合物的耐受组合物 -

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A gold-aluminum (Au-Al) solid phase diffusion flip chip bonding has been developed. In this technique, the Au bumps on the LSI are bonded directly to the Al wiring on the glass substrate by formation of a Au-Al diffusion layer. This paper reports on dependence of reliability on the bonding temperature and Al layer thickness, and analyses of interfaces produced. The results confirm that it is possible to achieve initial electric contact. Au4Al, Au5Al2, Au2Al and AuAl2 are generated between Au bump and Al wiring. The difference in composition of the intermetallic layer contributes to the bonding reliability. When the Au4Al content is the highest, a highly reliable bonding is obtained.
机译:已经开发出金铝(AU-A1)固相扩散倒装芯片粘合。在该技术中,通过形成Au-Al扩散层,LSI上的AU凸块直接粘合到玻璃基板上的Al布线上。本文报告了对键合温度和Al层厚度的可靠性的依赖性,以及所产生的接口分析。结果证实,可以实现初始电气接触。 Au4Al,Au5Al2,Au2Al和辅助2在Au Bump和Al接线之间产生。金属间层的组成差异有助于粘合可靠性。当AU4AL含量最高时,获得高度可靠的粘合。

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