Characterization of Pulsed-Laser Deposited BaTiO_3 Thin Films

摘要

BaTiO_3 thin films were grown on Si (1000 and UV transparent fused silica substrates by KrF (248 nm)excimer laser deposition. The analysis of thin films was performed using XRD, AFM, UV/VIS/NIR spectrometer and Nano-indenter to study general features of BaTiO_3 thin films and to optimize deposition parameters. The XRD spectra of BaTiO_3 films at 600 °C on Si (1000 show polycrystalline peaks with a strongly preferential orientation. The surface imaging was taken by AFM and shows obvious grain boundary structures. The transmittance spectra for BaTiO_3 films on UV fused silica were measured. The absorption increases rapidly below 380 nm. The effects of changing background O_2 gas pressure and substrate temperature were studied. Finally, the hardness and Young's reduced modulus scratch test of BaTiO_3 films were measured using Nano-indenter system.