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Structural characterization of Fe/Cu/Si(111) ultrathin films

机译:Fe / Cu / Si(111)超薄薄膜的结构表征

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Iron films of several thicknesses (1-50 monolayers, ML) were grown in ultra high vacuum conditions on Cu/Si(111) substrate. The evolution of the structural properties of the Fe films were studied by recording the polar angular behaviour of the diffracted Auger electrons in two different experimental configurations. The early stages of fcc γ-Fe(111) growth have been carefully investigated to assess the pseudomorphism of iron γ-phase. An analysis of the Auger electron diffraction (AED) patterns allows: a) to assess at 2.5-3 ML the iron film thickness at which most of the Fe atoms prefer to arrange in a bcc structure following the Kurdjmov-Sachs orientation, b) to put in evidence the existence of a few bcc arranged atomic nanostructures even for 1 monolayer (ML) iron coverage.
机译:在Cu / Si(111)基质上的超高真空条件下生长几种厚度(1-50单层,mL)的铁膜。通过以两种不同的实验配置记录衍射螺旋形电子的极性角度行为来研究Fe膜的结构性能的演变。已经仔细研究了FCCγ-Fe(111)生长的早期阶段,以评估铁γ相的假形式。对螺旋钻电子衍射(AED)图案的分析允许:a)在2.5-3ml的铁膜厚度下评估大多数Fe原子较喜欢在Kurdjmov-sachs定向,b)之后以BCC结构排列到表现出少数BCC排列的原子纳米结构即使是1单层(ML)铁覆盖率也存在。

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