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The monochromator for the synchrotron radiation beamline X-MOSS at ELETTRA

机译:Elettra同步辐射辐射射线X-MOS的单色器

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The optical configuration of the monochromator for the new beamline X-MOSS at the ELETTRA synchrotron ring is described. The requirements for this instrument are to collect a 3 mrad x 2 mrad aperture beam produced by a bending magnet in the 3-1400 eV energy range; the energy resolution has to be 3000 or better over the whole range, with a focused beam of the order of 10-50 mum. The designed monochromator, presently under construction, is a slitless four grazing inclidence optical elements: the first element is a one-meter paraboloidal mirror in sagittal focusing, then there is a plane mirror - plane grating dispersion system and finally a second one-meter paraboloidal mirror, also used in sagittal focusing. The latter focuses the radiation on the monochromator exit slit. This monochromator design is not limited by a defined working curve: in this way ti is possible to select the preferred operational parameters, to optimize either the flux or the resolution or the high order rejection. The monochromatic beam is finally sent on the sample under examination by an ellipsoidal refocusing mirror.
机译:描述了Elettra同步rotron环上的新光束线X-MOS的单色器的光学结构。该仪器的要求是收集由弯曲磁铁在3-1400 EV能量范围内产生的3mrad X 2 Mrad光束;在整个范围内,能量分辨率必须为3000或更好,具有10-50毫米的聚焦光束。目前正在建造的设计的单色器是无缝的四个放牧板光学元件:第一元素是在矢状聚焦中的单级抛物面镜,然后有一个平面镜面 - 平面光栅分散系统,最后是第二单抄表镜子,也用于矢状聚焦。后者将辐射聚焦在单色仪出口狭缝上。该单色仪设计不受定的工作曲线限制:以这种方式,TI可以选择优选的操作参数,以优化通量或分辨率或高阶抑制。最终通过椭圆形重新聚焦镜检查样品上的单色光束。

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