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Multiscale Simulations of Brittle Fracture and the Quantum-Mechanical Nature of Bonding in Silicon

机译:脆性脆性的多尺度模拟及硅粘合的量子 - 机械性质

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We simulate the microscopic details of brittle fracture in silicon by dynamically coupling empirical-potential molecular dynamics of a strained sample to a quantum-mechanical description of interatomic bonding at the crack tip. Our simulations show brittle fracture at loads comparable to experiment, in contrast with empirical potential simulations that show only ductile crack propagation at much higher loading. While the ductility of the empirical potentials can be attributed to their short range, it is unclear whether the increased range of the tight-binding description is sufficient to explain its brittle behavior. Using the multiscale method we show that at a temperature of 1100 K, but not at 900 K, a dislocation is sometimes nucleated when the crack tip impinges on a vacancy. While this result is too limited in length and time scales to directly correspond to experimental observations, it is suggestive of the experimentally observed brittle to ductile transition.
机译:我们通过将应变样品的经验耦合到裂纹尖端的间隙键合的量子力学描述来模拟硅中脆性脆性微观细节。我们的模拟在载荷上显示出与实验相当的脆性骨折,与实验潜在的模拟相比,仅显示在更高的负载下的延性裂纹繁殖。虽然经验势的延展性可以归因于它们的短范围,但目前尚不清楚紧密结合描述的增加的范围是足以解释其脆性行为。使用多尺度方法,我们显示在1100 k的温度下,但不在900 k时,当裂缝尖端撞击空位时,脱位有时会厘定。虽然该结果的长度和时间尺度过于有限,但直接对应于实验观察,提示实验观察到的脆性转变。

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