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Si/BDD/TiO_2 anodes: morphology and efficiency for the (photo) oxidation of oxalic anions

机译:SI / BDD / TIO_2阳极:(照片)氧化的形态和效率

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The use of TiO_2 as a photocatalyst for the destruction of organic chemical pollutants in aqueous systems has been extensively studied [1], [2]. There is a great deal of interest in using TiO_2 for waste treatment due to the low cost of the TiO_2 catalyst as well as the potential for using sunlight as the energy source. Illuminated slurries of TiO_2 has been shown to oxidize a wide range of organic pollutants, but the quantum yields for the photodegradation of organics are low and a costly catalyst recovery is needed from the large volumes of treated water. TiO_2 layers deposited onto titanium foils [3] recently used in solar decontamination of water [3], [4] have been shown to be more efficient than the TiO_2 slurries because the applied bias enhances a better separation of photogenerated charge carriers. The present work is devoted to the study of morphological properties and (photo)electrochemical behaviour of Tio_2 layers deposited onto electrically conducting boron doped diamond (BDD) films. During the last years, BDD films deposited on silicon wafers have been found to achieve electrochemical oxidation of many pollutants [5], [6] with a current efficiency close to 100% except in a very few cases, such as that of oxalic acid for which only 70% has been reached. With TiO_2 deposits on the Si/BDD surface, the electro-oxidation process could be enhanced but, due to the high cost of diamond films, these haven't been yet used as substrates for TiO_2 layers. However, in the recent years, large area, up to 0.3 m~2, of conducting diamond films, have been currently deposited on various substrates such as metallic foils, ceramics or silicon wafer [5] and this opens up new perspectives for using new composite materials such as Si/BDD/TiO_2. In order to reach more fundamental information about the morphological and photo-electrochemical properties of TiO_2 layers deposited onto conductive boron doped diamond (BDD) films one micron thick, we have systematically studied several thin layers of TiO_2 having thickness between 100 nm and 10 microns.
机译:使用TiO_2作为用于破坏水性系统中有机化学污染物的光催化剂的用途已经过度研究[1],[2]。由于TiO_2催化剂的低成本以及使用阳光作为能量源的可能性,使用TiO_2对废物处理有很大的兴趣。已经显示出氧化的TiO_2的照明浆料氧化各种有机污染物,但是对有机物的光降解的量子产率低,并且需要从大量的处理水中需要昂贵的催化剂恢复。沉积在钛箔上的TiO_2层最近用于水的太阳去污[3],[4],由于施加的偏压提高了光生电荷载体的更好分离,因此已经显示出比TiO_2浆化更有效。本作本作研究了沉积在导电硼掺杂金刚石(BDD)膜上的TiO_2层的形态学性质和(照片)电化学行为的研究。在过去几年中,已经发现沉积在硅晶片上的BDD薄膜来实现许多污染物的电化学氧化[5],[6],电流效率接近100%,除非在很少的情况下,例如草酸的含量已达到70%。通过在Si / BDD表面上的TiO_2沉积物,可以提高电氧化过程,但由于金刚石薄膜的高成本,这些尚未用作TiO_2层的基板。然而,在近年来,目前已经存放在各种基板上的大面积,高达0.3 m〜2,诸如金属箔,陶瓷或硅晶片等各种基板上,这为使用新的新观点开辟了新的视角复合材料如Si / BDD / TiO_2。为了达到沉积在导电硼掺杂金刚石(BDD)膜上的TiO_2层的形态学和光电化学性质的更基本的信息,我们系统地研究了几个TiO_2的薄层,厚度在100nm和10微米之间。

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