Fundamental studies of molecular interactions and dissolution inhibition in poly(norbornene-alt-maleic anhydride) based resins

摘要

A class of single layer 193 nm chemically amplified resist first described by Bell Laboratories,and subsequently developed under a joint agreement between Lucent and Arch Chemicals is based upon an alternating copolymer of norbornene (NB) and maleic anhydride (MA) which also contains a small proportion (8 to 20%) of a third component such as tert-butyl esters of acrylic acid (TBA) containing an acid cleaveable moiety.