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Atomic Layer Deposition of Nanoalloys of Noble and Non-noble metals

机译:贵族和非贵金属纳米合金的原子层沉积

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We present a novel ALD-based approach for the synthesis of bimetallic materials consisting of a noble metal along with a non-noble metal such as Pt-M (M = In, Ga, Sn, etc.), with a precise control on the composition and size. First, a bilayer consisting of a metal oxide and a Pt film of the desired thickness is deposited on to the substrate. The film is then subjected to a temperature programmed reduction (TPR) under H_2 atmosphere. In situ X-ray diffraction (XRD) measurements during TPR revealed the formation of Pt-M bimetallic alloys with a phase determined by the Pt/(Pt + M) atomic ratio of the as-deposited bilayer. Scanning electron microscopic (SEM) analysis revealed the formation nanoparticles after annealing, with the particle size controlled by the initial total thickness of the bilayer.
机译:我们提出了一种基于新的ALD方法,用于合成由贵金属组成的双金属材料以及非贵金属,例如Pt-M(M = In,Ga,Sn等),具有精确的控制构成和大小。首先,将由所需厚度的金属氧化物和Pt膜组成的双层沉积在基板上。然后将薄膜在H_2大气下进行温度编程(TPR)。在TPR期间的原位X射线衍射(XRD)测量揭示了由由沉积的双层的Pt /(Pt + M)原子比确定的相位为Pt-M双金属合金。扫描电子显微镜(SEM)分析显示出退火后的形成纳米粒子,粒度由双层的初始总厚度控制。

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