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Atomic layer deposition of nanoalloys of noble and non-noble metals

机译:贵金属和非贵金属纳米合金的原子层沉积

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摘要

We present a novel ALD-based approach for the synthesis of bimetallic materials consisting of a noble metal along with a nonnoble metal such as Pt-M (M = In, Ga, Sn, etc.), with a precise control on the composition and size. First, a bilayer consisting of a metal oxide and a Pt film of the desired thickness is deposited on to the substrate. The film is then subjected to a temperature programmed reduction (TPR) under H2 atmosphere. In situ X-ray diffraction (XRD) measurements during TPR revealed the formation of Pt±M bimetallic alloys with a phase determined by the Pt/(Pt + M) atomic ratio of the as-deposited bilayer. Scanning electron microscopic (SEM) analysis revealed the formationnanoparticles after annealing, with the particle size controlled by the initial total thickness of the bilayer.
机译:我们提出了一种基于ALD的新颖方法,用于合成由贵金属与非贵金属(例如Pt-M(M = In,Ga,Sn等)组成的双金属材料,并精确控制其成分和尺寸。首先,将由金属氧化物和所需厚度的Pt膜组成的双层沉积到基板上。然后在氢气气氛下对膜进行程序升温还原(TPR)。 TPR期间的原位X射线衍射(XRD)测量表明,形成的Pt±M双金属合金的相由沉积的双层的Pt /(Pt + M)原子比决定。扫描电子显微镜(SEM)分析显示退火后形成的纳米颗粒,其粒径由双层的初始总厚度控制。

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