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Fabrication of low-resistivity contacts between normal conductor and HTS by control of electronic structure of their interface

机译：通过控制界面的电子结构，在正常导体和HTS之间制造低电阻率接触

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《低温工学·超電導学会講演会》|2000年||共1页
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Notio Terada; Yoshitaka Kinoue; Taishi Fukida; Kozo Obara; Hideo Ihara;
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中图分类 TB6-53;
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1. MATERIALS DESIGN OF THE CODOPING FOR THE FABRICATION OF LOW-RESISTIVITY P-TYPE ZNSE AND GAN BY AB-INITIO ELECTRONIC STRUCTURE CALCULATION [J] . Katayamayoshida H., Yamamoto T. Physica status solidi, B. Basic research . 1997,第2期

机译：利用绝对电子结构计算法制备低电阻率P型ZNSE和GAN的材料设计
2. Low-Resistivity Bi_2Sr_2CaCu_2O_(8+δ)/Au Contacts for Fabrication of Stacked Intrinsic Josephson Junctions [J] . Hiroki Ishida, Takahiro Kato, Katsuyoshi Hamasaki, Japanese journal of applied physics . 2008,第2issue1期

机译：低电阻Bi_2Sr_2CaCu_2O_（8 +δ）/ Au触点用于堆叠本征约瑟夫森结的制造
3. Surface study and fabrication of low-resistivity contacts onCu-1234 superconductor [J] . Terada N., Iyo A., Ihara H., IEEE Transactions on Applied Superconductivity . 1997,第2期

机译：Cu-1234超导体上低电阻率触点的表面研究和制备
4. Fabrication of low-resistivity contacts between normal conductor and HTS by control of electronic structure of their interface [C] . Notio Terada, Yoshitaka Kinoue, Taishi Fukida, 低温工学·超電導学会講演会 . 2000

机译：通过控制界面的电子结构，在正常导体和HTS之间制造低电阻率接触
5. Electrical contacts to individual nanostructures and fabrication of nanoscale gaps by feedback controlled electromigration. [D] . Johnston, Danvers Errol. 2008

机译：通过反馈控制的电迁移与单个纳米结构进行电接触并制造纳米级间隙。
6. Fabrication of Multscale Fractal-Like Structures by Controlling Fluid Interface Instability [O] . Tanveer ul Islam, Prasanna S. Gandhi -1

机译：通过控制流体界面的不稳定性来制造多尺度的分形样结构
7. Fabrication and Characterization of Novel Lateral Surface Superlattice Structure Utilizing Schottky Barrier Height Control by Doped Silicon Interface Control Layers [O] . Kasai, Seiya, Hasegawa, Hideki 1996

机译：利用掺杂的硅界面控制层控制肖特基势垒高度的新型侧面超晶格结构的制备与表征
8. Low frequency electrical noise across contacts between a normal conductor and superconducting bulk YBa2Cu3O7 [R] . Hall, J., Chen, T. M. 1991

机译：正常导体和超导体YBa2Cu3O7之间的接触上的低频电噪声

Fabrication of low-resistivity contacts between normal conductor and HTS by control of electronic structure of their interface

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