Ultra-Low Defect Thiol Monolayer for Nanometric Template for Metal Electrodeposition

摘要

An electrochemical method to deposit a monolayer of thiols with very few defects on a gold substrate was developed.The methodology consists in using cyclic voltammetry to oxidatively deposit a monolayer and reductively removing it from a gold substrate for up to 10 times.This first step is followed by a deposition of a monolayer at a fixed potential for less than 15 minutes.The characterization of the resulting monolayers by electrochemical AC impedance spectroscopy reveals a resistance to the charge transfer of a redox couple (ferri/ferrocyanide) that is much lareer than the one of monolavers deposited in absence of an electric field.