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Analytical Approximations for the Distributions of Substitutional Transition Metal Defects in Silicon Float Zone Crystals

机译:硅浮区晶体中替代过渡金属缺陷分布的分析近似

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In previous work /1,2/ it was reported about the distributions of substitutional transition metal (TM) defects in silicon.These investigations were performed on 0.8 inch FZ crystals grown with the velocity V=3.4 mm/min,where the metal doping was incorporated during crystal growth.Respecting several features of the dopants,it was suitable to distinguish between the groups Cu,Ni,Co,Ag,Pd (I) and Rh,Au,Pt,IT (II).
机译:在以前的工作/ 1,2 /据报道硅中的替代过渡金属(TM)缺陷的分布。这些研究是对用速度v = 3.4mm / min生长的0.8英寸Fz晶体进行,其中金属掺杂在晶体生长过程中掺入。尊重掺杂剂的几个特征,它适合区分Cu,Ni,Co,Ag,Pd(I)和Rh,Au,Pt,IT(II)。

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