首页> 外文会议>Seventh Symposium on High Purity Silicon at the 202nd Meeting of the Electrochemical Society Oct 20-25, 2002 Salt Lake City, Utah >ANALYTICAL APPROXIMATIONS FOR THE DISTRIBUTIONS OF SUBSTITUTIONAL TRANSITION METAL DEFECTS IN SILICON FLOAT ZONE CRYSTALS
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ANALYTICAL APPROXIMATIONS FOR THE DISTRIBUTIONS OF SUBSTITUTIONAL TRANSITION METAL DEFECTS IN SILICON FLOAT ZONE CRYSTALS

机译:硅浮区晶体中取代过渡金属缺陷分布的解析近似

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It is reported about the formation rate of substitutional transition metal (TM) defects (M_s) in dislocated (D) and dislocation-free (DF) 0.8 inch FZ crystals. Theoretical and experimental results are presented for the metals Cu, Ni, Co, Ag, Pd (group Ⅰ) and Rh, Au, Pt, Ir (group Ⅱ). It is shown, that the frozen-in concentration Ns(0) can be determined by solving the Frank-Turnbull rate equation. For a given vacancy distribution Cv(T), characterized by its dependence on temperature, all dopants can be arranged according to their binding energies EB, which are connected with characteristic temperatures T_c. Calculations of N_s(0) are performed by integration with the steepest descent method for D-crystals considering different cooling rates and additionally for vacancy dominated (Ⅴ) and interstitial dominated (Ⅰ) regions of DF-crystals. It is shown, that the void and swirl formation in Ⅴ- and Ⅰ-regions have a strong influence on N_s(0) in most cases. From a comparison between theoretical and experimental results the binding energies 2.0 to 2.5 eV (group Ⅰ) and 2.6 to 3.0 eV (group Ⅱ) are derived. The reduced concentrations N_s(0)/N_D as observed in Ⅴ-regions, for example, are in the range between 3-10~9-4) and 1 for E_B = 2 up to 3 eV, where ND is the total TM doping concentration.
机译:据报道,在位错(D)和无位错(DF)的0.8英寸FZ晶体中,替代过渡金属(TM)缺陷(M_s)的形成速率。给出了Cu,Ni,Co,Ag,Pd(Ⅰ类)和Rh,Au,Pt,Ir(Ⅱ类)金属的理论和实验结果。结果表明,可以通过求解弗兰克-特恩布尔速率方程来确定冻结浓度Ns(0)。对于以其对温度的依赖性为特征的给定空位分布Cv(T),可以根据与特征温度T_c有关的结合能EB来排列所有掺杂剂。 N_s(0)的计算是通过结合最速下降法对D晶体进行考虑的,该冷却方法考虑了不同的冷却速率,另外还对DF晶体的空位为主(Ⅴ)和间隙为主(Ⅰ)区进行了计算。结果表明,在大多数情况下,Ⅴ区和Ⅰ区的空隙和旋流形成对N_s(0)有很大的影响。通过理论和实验结果的比较,得出了结合能2.0〜2.5eV(Ⅰ组)和2.6〜3.0eV(Ⅱ组)。在Ⅴ区观察到的降低浓度N_s(0)/ N_D例如在3-10〜9-4之间,对于E_B = 2直至3 eV,其浓度为1,其中ND是总的TM掺杂浓度。

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