首页> 外文会议>The Meeting of the Electrochemical Society >Electrochemistry in Ultrahigh Vacuum:Underpotential Deposition of Al on W from AlCl_3/1-ethyl-3-methyl-imidazolium Ambient Temperature Chloroaluminate Melts
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Electrochemistry in Ultrahigh Vacuum:Underpotential Deposition of Al on W from AlCl_3/1-ethyl-3-methyl-imidazolium Ambient Temperature Chloroaluminate Melts

机译:超高真空中的电化学:Al an on Al al的突然沉积来自alcl_3 / 1-乙基-3-甲基 - 咪唑鎓环境温度氯铝酸盐熔体

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Room temperature molten salts have emerged as a very promising class of ionic liquids with application in a variety of technologically important areas.Among the most interesting and unique properties some of these ionic liquids display is a very wide liquid temperature range and very low vapor pressure.3 Attention in the electrochemical community has been focused in part on the possibility of electro-depositing Al and Al-based alloys from AlCl_3/1-ethyl-3-methylimidazolium chloride (EMIC) ambient temperature chloroaluminate melts,which have an adjustable Lewis acidity and ionic composition dependent on the AlCl_3/RCl molar ratio (N).
机译:室温熔盐已成为一种非常有前途的离子液体,具有各种技术重要的地区的应用。among最有趣和独特的特性,其中一些离子液体显示器是非常宽的液体温度范围和非常低的蒸气压。在电化学群落中的3重点是从AlCl_3 / 1-乙基-3-甲基咪唑(EMIC)环境温度氯铝酸盐氯化物(EMIC)的氯铝酸盐和氯铝酸盐和具有可调节的路易斯酸度和离子组合物依赖于AlCl_3 / Rcl摩尔比(N)。

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