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Growth of bismuth telluride thin films by hot wall epitaxy, thermoelectric properties

机译:热壁外延,热电性能的碲化铋薄膜的生长

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摘要

It is well known that bisumth telluride (Bi_2Te_3), its isomorphs (Bi_2Se_3 and Sb_2Te_3) and their alloys have the optimum bandgap (0.13 eV to 0.21 eV) for efficient solid state cooling applications around 300K. Recently interesting work argued that the use of quantum well structures can enhance the figure of merit ZT as a result of the improvement of carrier charge density of state and the reduction of the thermal conductivity. However, for the production of such structures it is necessary to establishe the optimum growth conditions and the doping levels of thin films based on Bi_2Te_3 and its isomorphs.
机译:众所周知,Bisumth碲化物(Bi_2Ste_3),其异构(Bi_2se_3和SB_2Te_3)及其合金具有最佳的带隙(0.13eV至0.21eV),用于高效固态冷却应用约为300k。最近有趣的工作认为,由于载流子充电密度的改善和导热率的降低,使用量子阱结构的使用可以增强优异ZT的图。然而,对于生产这种结构,需要基于Bi_2Te_3及其异构体建立最佳生长条件和薄膜的掺杂水平。

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