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Preparation of Smooth Zinc Oxide Thin Film via Liquid Phase Reaction with Cation Additives

机译:用液相反应与阳离子添加剂制备光滑的氧化锌薄膜

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摘要

ZnO thin films were deposited in a solution with Zn(NO3)2 and DMAB from 60 to 80°C. The effects of cation additives such as Mg, Ga and Al in a aqueous solution were investigated on surface morphology, crystallographic structure and growth rate. By adding 1E~(-4) mol/l of Ga or Al, the growth rate was enhanced from 0.13μm/h to 0.35-0.38μm/h. In addition, the surface morphology became flat in the case of Al addition.
机译:ZnO薄膜沉积在Zn(NO 3)2和DMAB的溶液中,从60至80℃沉积。研究了阳离子添加剂如Mg,Ga和Al在水溶液中的影响,对表面形态,结晶结构和生长速率进行了研究。通过加入1E〜(-4)Mol / L的Ga或Al,生长速率从0.13μm/ h增强至0.35-0.38μm/ h。此外,在Al添加的情况下,表面形态变得平坦。

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