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The Effect of Gate Geometry on the Charging Characteristics of Metal Nanocrystal Memories

机译:闸门几何对金属纳米晶回忆充电特性的影响

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This study presents the effect of gate geometry on the charging characteristics of metal nanocrystal memories. The effect is studied by varying the perimeter to area ratio, number of convex corners and concave comers of the gate of a metal-oxide-semiconductor (MOS) capacitor with embedded gold nanocrystals. It can be observed that the nanocrystal charging rate increases for a smaller perimeter to area ratio. The presence of concave and convex comers increases the nanocrystal charging rate. Based on this study it is expected thai gate geometries with low perimeter to area ratio and with selected convex and concave corners would increase the nanocrystal charging rate.
机译:本研究介绍了栅极几何形状对金属纳米晶体记忆的充电特性的影响。通过改变周边的面积比,金属氧化物半导体(MOS)电容器的栅极的凸角数和凹入凹凸的数量和嵌入金纳米晶体的沟槽和凹入的效果研究。可以观察到,纳米晶体充电率增加较小的周边到面积比。凹凸和凸链的存在增加了纳米晶体充电率。基于该研究,它是预期的泰国浇口几何,具有低周边的面积比,并且选择凸起和凹角将增加纳米晶体充电率。

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