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PMN-PT thin films: Electromechanical behaviour, polarisability and microstructure

机译:PMN-PT薄膜:机电行为,极热性和微观结构

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Thin film capacitor structures of Pb(Mg_(1/3)Nb_(2/3))O_3 (PMN)-PbTiO_3 (PT) were fabricated using pulsed laser deposition (PLD) on MgO{100} substrates using (La_(1/2), Sr_(1/2))CoO_3 (LSCO) as a lower electrode. Crystallographic and dielectric characterization confirmed perovskite relaxor-like behaviour. Measurements of the electrostrictive coefficients by insitu X-ray diffraction, piezo-response atomic force microscopy and three point bending experiments showed both Q_(11) and Q_(13) to be comparable to accepted values for single crystals. However, for a given field, the electric field-induced strain in the thin films was much less than that of single crystal. This was clearly intimately like to poor thin film polarisability. Previous work had shown sol-gel PMN-PT films to have significantly greater permittivities than PLD films, and a TEM investigation was undertaken to see if functional differences could be related to differences in microstructue, and hence if the functional and electromechanical properties of PLD films could be improved by attempting to replicate sol-gel microstructures.
机译:使用PGO {100}基板上的Pb(Mg_(1/3)Nb_(2/3))O_3(PMN)-PbTiO_3(PT)的薄膜电容器结构使用(LA_(1 / 2),SR_(1/2))COO_3(LSCO)作为下电极。结晶和介电表征证实了Perovskite松弛的行为。通过Insitu X射线衍射测量,压电响应原子力显微镜和三点弯曲实验显示Q_(11)和Q_(13)与单晶的接受值相当。然而,对于给定场,薄膜中的电场诱导的应变远小于单晶的菌株。这显然就像薄薄的薄膜聚光性一样密切地看起来很差。以前的工作显示了溶胶 - 凝胶PMN-PT薄膜比PLD膜具有显着更大的兴高率,并且进行了TEM调查,看看功能差是否可能与微观结构的差异有关,因此如果PLD薄膜的功能和机电性能有关。可以通过试图复制溶胶 - 凝胶微结构来改善。

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