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Features of Semiconductors during Nanoindentation

机译:纳米凸缘期间半导体的特征

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Si and InSb were subject to depth sensing multi-cycling nanoindentation. The load-depth-curves exhibited hysteresis loops which are explained in terms of pressure induced phase transformations. In order to study the impact of crystal distortions on phase transformation, the specimens were subject to boron implantation (ion energy 180 keV) of different implantation doses (10~(14) to 10~(17) ions/cm~2) and indented without annealing. In InSb, the hysteresis loops disappeared after implantation of 10~(16) ions/cm~2, and for Si with its stronger bonds, a dose of 3 * 10~(16)/cm~2 is required for the same effect. Indentation cycling with constant maximum load results in a sudden disappearance of the hysteresis loop after a small gradual loop area reduction during the first initial cycles.
机译:Si和Insb受到深度感测多循环纳米凸缘。载荷深度曲线表现出滞后环,其在压力诱导的相变性方面解释。为了研究晶体扭曲对相变的影响,试样对不同植入剂量的硼注入(离子能量180keV)(10〜(14)至10〜(17)离子/ cm〜2)和缩进没有退火。在INSB中,滞后环在植入10〜(16)离子/ cm〜2后消失,并且对于具有较强的键的Si,效果需要3×10〜(16)/ cm〜2的剂量。在第一初始循环期间减少小逐渐循环区域减少后,具有恒定最大载荷的压痕循环导致滞后环的突然消失。

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