Synthesis and radical polymerization of pyrocarbonate functionalized monomers: application to positive-tone photoresists

摘要

The synthesis of two new tert-butyl carbonic anhydride monomers, 4-vinylhenzoic and methacrylic tert-butyl carbonic anhydride was achieved successfully. Radical polymerization at 45°C yielded tert-butyl pyrocarbonate protected materials. Thermographic analysis showed that both polymers decompose cleanly at 135°C. The lithographic performance of both materials was evaluated in presence of 2,4,6-tris-(trichloromethyl)-s-triazine as photoacid generating species. It was demonstrated that the large polarity change resulted in a chemically amplified positive photoresist system.