首页> 外文会议>Materials Research Society Symposium >Advanced characterization of ultra-low-k periodic porous silica films-pore size distribution, pore-diameter anisotropy, and size and macroscopic isotropy of domain structure
【24h】

Advanced characterization of ultra-low-k periodic porous silica films-pore size distribution, pore-diameter anisotropy, and size and macroscopic isotropy of domain structure

机译:高低k周期多孔二孔二孔膜 - 孔径分布,孔径各向异性和尺寸和宏观各向异性的高级表征

获取原文

摘要

We have shown previously the results from out-of-plane and in-plane X-ray scattering/di (Traction measurements together with transmission electron microscope and X-ray reflectance measurements and shown that they are effective in characterization of a periodic porous silica low-k film [1], In the present work, we report the results on pore-size distribution, pore-diameter anisotropy, and size and macroscopic isotropy of domain structure.
机译:我们先前已经示出了平面外和平面内X射线散射/ DI的结果(牵引测量与透射电子显微镜和X射线反射率测量一起,并表明它们是有效的,以表征周期多孔二氧化硅低-K薄膜[1],在本作工作中,我们报告了孔径分布,孔径各向异性和尺寸和巨大各向异性的结果的结果。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号